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题名:
Phase mode nanomachining on ultra-thin films with atomic force microscopy
作者: Shi JL(施佳林); Liu LQ(刘连庆); Yu P(于鹏); Li GY(李广勇)
作者部门: 机器人学研究室
通讯作者: 刘连庆
关键词: Atomic force microscopy ; Thin films ; Wear and tribology
刊名: Materials Letters
ISSN号: 0167-577X
出版日期: 2017
卷号: 209, 页码:437-440
收录类别: SCI ; EI
产权排序: 1
项目资助者: National Natural Science Foundation of China (Grant Nos. U1613220, 61522312 and 61375107).
摘要: Machining or patterning ultra-thin films with specified structures are critical challenges. In this work, a novel mode of atomic force microscopy nanomachining is proposed. The phase response of the cantilever is used as the input of feedback control to modulate the machining force to achieve the desired machined depth. The proposed phase mode, overcoming the disadvantages of force mode, is not affected by the debris piled-up and has the ability to sense the interface of an ultra-thin film and predict the machining depth without post-imaging. The effectiveness of the phase mode has been proven by experiments.
语种: 英语
EI收录号: 20173404073812
WOS记录号: WOS:000413124300112
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.sia.cn/handle/173321/20843
Appears in Collections:机器人学研究室_期刊论文

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Recommended Citation:
Shi JL,Liu LQ,Yu P,et al. Phase mode nanomachining on ultra-thin films with atomic force microscopy[J]. Materials Letters,2017,209:437-440.
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