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High-resolution additive direct writing of metal micro/nanostructures by electrohydrodynamic jet printing
Zou WH(邹旿昊)1,2,3; Yu HB(于海波)1,2; Zhou PL(周培林)1,2,3; Zhong Y(仲亚)1,2,3; Wang YC(王越超)1,2; Liu LQ(刘连庆)1,2
Department机器人学研究室
Source PublicationApplied Surface Science
ISSN0169-4332
2021
Volume543Pages:1-10
Indexed BySCI ; EI
EI Accession number20205209694429
WOS IDWOS:000613951500003
Contribution Rank1
Funding OrganizationNational Natural Science Foundation of China (Grant Nos. 61925307, 61727811, 91748212, U1613220, and 61821005) ; External Cooperation Program of the Chinese Academy of Sciences (Grant No. 173321KYSB20170015) ; Youth Innovation Promotion Association of the Chinese Academy of Sciences (Grant No. Y201943) ; LiaoNing Revitalization Talents Program (Grant No. XLYC1807006)
KeywordE-jet printing Mask-free direct writing Nanoscale printing resolution Metal micro/nanoelectrodes Fully printed graphene photodetectors
Abstract

Patterned conductive structures have attracted significant attention as important components of printed and flexible micro/nanodevices. However, the fabrication of conductive micro/nanostructures with controlled and well-organized morphologies is a key challenge in the development and application of micro/nanoelectronic devices based on low-dimensional materials. To meet the requirements of depositing conductive structures on specific substrates, electrohydrodynamic jet (E-jet) printing, developed as a simple and effective method for fabricating micro/nanopatterns of polymers, was combined with a conventional wet metal etching process for patterning conductive metals on polymer substrates. Under optimized experimental conditions, we achieved fine straight-line patterns with a line spacing of 1 μm at a nanoscale printing resolution (average line width: 68 nm) and grid patterns with variable spacings and grid line widths, down to size of 871 nm. Furthermore, fully printed graphene photodetectors were obtained through in situ direct writing, and their photoelectric response to a change in photocurrent of 0.22 μA was demonstrated. The results suggest that combining E-jet printing with chemical etching is a promising mask-free approach for producing conductive metal patterns for micro/nanoelectronic devices.

Language英语
WOS SubjectChemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS Research AreaChemistry ; Materials Science ; Physics
Funding ProjectNational Natural Science Foundation of China[61925307] ; National Natural Science Foundation of China[61727811] ; National Natural Science Foundation of China[91748212] ; National Natural Science Foundation of China[U1613220] ; National Natural Science Foundation of China[61821005] ; External Cooperation Program of the Chinese Academy of Sciences[173321KYSB20170015] ; Youth Innovation Promotion Association of the Chinese Academy of Sciences[Y201943] ; LiaoNing Revitalization Talents Program[XLYC1807006]
Citation statistics
Cited Times:6[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sia.cn/handle/173321/28407
Collection机器人学研究室
Corresponding AuthorYu HB(于海波); Liu LQ(刘连庆)
Affiliation1.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, China
2.Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang 110016, China
3.University of Chinese Academy of Sciences, Beijing 100049, China
Recommended Citation
GB/T 7714
Zou WH,Yu HB,Zhou PL,et al. High-resolution additive direct writing of metal micro/nanostructures by electrohydrodynamic jet printing[J]. Applied Surface Science,2021,543:1-10.
APA Zou WH,Yu HB,Zhou PL,Zhong Y,Wang YC,&Liu LQ.(2021).High-resolution additive direct writing of metal micro/nanostructures by electrohydrodynamic jet printing.Applied Surface Science,543,1-10.
MLA Zou WH,et al."High-resolution additive direct writing of metal micro/nanostructures by electrohydrodynamic jet printing".Applied Surface Science 543(2021):1-10.
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